PICTOS
Enables in-line, at-line, and off-line measurementsThe technology is based on QICPIC dynamic image analysisIntegrates directly into production processes and samplingSupports both dry and wet dispersionEnables real-time process monitoring and QC/PAT applicationsAutomatic data transfer for process controlSuitable for powders, suspensions, and emulsionsReduces the need for separate laboratory tests
PICTOS is Sympatec’s process-integrated solution for dynamic image analysis, bringing particle size and shape analysis based on QICPIC technology directly into the production environment. It enables measurements in in-line, at-line, and off-line applications without a separate laboratory step.
PICTOS brings dynamic imaging particle analysis closer to the production line, providing a continuous view of process behaviour. This improves quality control, speeds up decision-making and reduces the delay between measurement and process control.
The system can be tailored to different industrial environments and operates flexibly with a variety of sample flows and process conditions. The system supports effective quality assurance and process optimisation directly at the production level.
The solution offers significant benefits, particularly in the process industry:
- Improves quality control (QC) using real-time data
- Supports the PAT (Process Analytical Technology) approach
- Enables a faster response to changes in processes
- Reduces the need for manual laboratory analyses
- Improve the repeatability and manageability of the process
- Enhance production optimisation and resource utilisation
The system can be tailored to different industrial environments and operates flexibly with a variety of sample flows and process conditions. The equipment utilises the same technology as the QICPIC system designed for laboratories.
PICTOS on-line measurement enables automatic analysis of particle size distribution from a sample taken from the process without the need for a continuous sensor in the production stream.
The sample is controlled into a separate measurement unit, where it is analyzed under optimal conditions based on dynamic image analysis.
Key features:
- Automatic sampling directly from the process stream
- Measurement in a separate, controlled measurement unit
- Suitable for both dry and liquid materials, depending on the system configuration
- No continuous probe in the process, but repeatable sample analysis
- Good balance between process monitoring and measurement control
PICTOS on-line enables reliable and repeatable particle size distribution monitoring in a production environment where automation and controlled measurement are desired.
More information here.
PICTOS at-line measurement enables the analysis of particle size distribution from a sample taken from the process near the production line, without the delay associated with laboratory measurements.
The sample is taken from the process and analyzed at a controlled measurement point using dynamic image analysis, combining speed with a controlled measurement environment.
Key features:
- The sample is taken from the process and measured in the production environment
- Fast analysis without sending samples to a laboratory
- Controlled and repeatable measurement environment
- Suitable for both dry and liquid analyses, depending on the system configuration
- Excellent for routine monitoring and process control
PICTOS at-line provides fast and reliable feedback on the process close to production, enabling effective quality control and rapid response to process changes.
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PICTOS off-line measurement enables the analysis of particle size distribution in a separate laboratory measurement outside the process when maximum control and accuracy are required.
Samples are collected from the production process and analyzed under controlled laboratory conditions using dynamic image analysis, ensuring highly repeatable and comparable results.
Key features:
- Samples are taken separately from the process and analyzed in the laboratory
- No direct integration into the production line
- Maximum control over measurement conditions and sample handling
- Suitable for both dry and liquid analyses, depending on the system configuration
- Excellent for validation, research, and quality assurance
PICTOS Off-Line serves as a reliable reference measurement that can be used for comparing, calibrating, and quality assurance of process measurements.
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